Description
Thin layer deposition processes modifies substrate physical properties. For critical applications the most efficient atomic control is required. In this way, microelectronic tools need non-destructive in-situ characterization tool to control variations of the deposition steps under a very high vacuum. Several optical measurement systems have been developed but they are complex, expensive, and difficult to implement by non-specialists.Our solution allows the simultaneous measurement of several atomic flow in a simple and robust way.
Applications
Microelectronics equipements:- Epitaxy (MBE, MOCVD…)
- Thin layer deposition (CVD, Evaporation)
