Simultaneous atomic absorption analysis of multiple elements
The thin film modifies the properties of the substrate on which it is deposited. For the most demanding applications, where control down to the atomic layer is required, the frames used are in a very high vacuum. Within these frames, non-destructive in-situ testing is required to control variations in the plating stages.
Various systems have been developed for optical measurement. They involve complex, expensive components that are difficult for non-specialists to install.
COMPETITIVE ADVANTAGES
- Robust implementation
- Simultaneous measurement of flux from several elements
- Lamp intensity drift and optical path drift due to slow thermal variations are measured and taken into account
APPLICATIONS
Microelectronics equipment:
- Epitaxy (MBE, MOCVD, etc.)
- Thin film deposition (CVD, Evaporation)
INTELLECTUAL PROPERTY
- Patent
DEVELOPMENT STAGE
Experimental proof of concept
LABORATORY
- LAAS
Description
The technological solution developed enables the simultaneous measurement of the fluxes of several atomic elements in a simple and robust way. For each element, a hollow cathode lamp emits several lines specific to the chosen element, and one or more of these lines are detected by a 1D spectrometer.
The instrument consists of:
- Light objects such as cathode lamps at the wavelengths of the materials of interest
- A dual-core optical fibre
- A 1D spectrometer
- Real-time image processing software
Technical specifications
- Measurement time: From a few milliseconds to several hours
- Sampling frequency: 10 Hz
- Light source: Direct,uninterrupted
- Type of spectrometer: 1D